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Citric acid/tartaric acid as complexing agent in sodium carbonate based CMP slurry for tantalum
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Author : Arpita Shukla, S. Noyel Victoria and R. Manivannan*
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ABSTRACT
In the present work Ta disk was polished using slurry composed of alumina and sodium carbonate (Na2CO3) as abrasive and oxidizer respectively, and citric acid (C6H8O7) or tartaric acid (C4H6O6) as complexing agent. For slurry formulation alumina (2 wt%) and Na2CO3 (1 wt%) and various concentrations of citric acid and tartaric acid were chosen for tantalum (Ta) chemical mechanical planarization. The influence of change in pH, complexing agent concentration, pressure and rotational platen speed on Ta removal rate (RR) were inspected and the outcomes are stated. Potentiodynamic polarization curves for tantalum with both the complexing agents were studied and the results are reported. An electrical equivalent circuit is proposed to describe the EIS results.
KEYWORD
CMP, tantalum, sodium carbonate, complexing agents, electrochemical characterization